Method for processing substrates

ABSTRACT

The method for processing substrates for substrate processing facility includes the steps of performing ventilation a the fan filter unit while putting a lid of a container in a closed state, when the container is stored in a storage shelf, and is transferred with a substrate transfer device, and ventilating the container with the fan filter with the lid of the container in an open state, when substrates are transferred in a substrate loading/unloading section with the substrate transfer device.

BACKGROUND OF THE INVENTION

The present invention relates to substrate processing methods forsubstrate processing facilities.

The substrate processing method for this purpose is for manufacturingprocessed substrates by storing in storage shelves containers, each ofwhich vertically holds a plurality of substrates such as glasssubstrates used for liquid display devices or plasma display devicesaligned at certain intervals, subsequently transferring the storedcontainers to a substrate loading/unloading section of each substrateprocessing device with a container transfer device, and subsequentlyperforming prescribed processes such as such as coating, exposure anddeveloping, on substrates stored in the containers in a plurality ofsubstrate processing devices. Also in the substrate processing method,when any time lag occurs in processing a certain substrate while thecontainers are sequentially transferred to the substrateloading/unloading section of the substrate processing device due tovariance in the processing amount among substrate processing devices,the container that stores the certain substrate is temporarily stored inthe storage shelf with the substrate stored therein.

One conventional example of such substrate processing methods is asdescribed below. Conventionally, a clean air ventilation means fortransfer area that performs ventilation with clean air (or filtered air)in order to maintain purity of a substrate transfer area where asubstrate transfer device transfers substrates between the substrateloading/unloading sections and the substrate processing devices isprovided, the container is formed in a quadrangular tube shape turnedover sideways, an opening on one end side thereof serving as an entrancefor loading and unloading the substrates, a fan filter unit thatperforms ventilation from an opening on the other end side to theentrance of the container is provided in an opening portion on the otherend side of the container, and purity of the substrates is maintained byperforming ventilation with the fan filter unit when the container istransferred by the container transfer device, and operation of the fanfilter unit is stopped when the substrates are transferred to or fromthe substrate loading/unloading section with the substrate transferdevice (see for example, JP 2001-308169A).

Even when the substrates are stored in the storage shelf, purity ofsubstrates can be maintained by ventilating the container with the fanfilter unit. In addition, by maintaining purity of the substratetransfer area with the clean air ventilation means for transfer area,purity of the substrates that are removed from the container andtransferred in the substrate transfer area is maintained.

In the above-described conventional substrate processing method, whenthe container is stored in the storage shelf and transferred with thecontainer transfer device, by performing ventilation with clean air froman opening on the other end side toward the entrance of the containerwith the fan filter unit, the clean air being discharged from theentrance, dust present inside the container is prevented from attachingto the substrate and also, outside air is prevented from entering insidethe container even when airflow around the container is disturbed due tooperation of the container transfer device or the like, therebymaintaining purity of substrates in the container.

However, when ventilation is performed when the container is stored inthe storage shelf and is transferred with the container transfer device,if ventilation is performed with the fan filter unit, although the speedof air inside the container may be comparatively low as long as dustpresent inside the container is prevented from attaching to substrates,it is necessary to set the speed of air discharged from the containercomparatively high in order to prevent back flow of the outside air fromthe entrance. For this reason, the ventilation flow rate of the fanfilter unit is increased so as to keep the speed of air discharged fromthe container comparatively high, and moreover, the ventilation with thefan filter unit is continued for a long period that is total of timerequired to store the container in the storage shelf and time requiredto transfer the container with the container transfer device. Therefore,the running cost of the fan filter unit is increased, which increasesthe cost to manufacture processed substrates.

Also, when substrates are transferred in the substrate loading/unloadingsection with the substrate transfer device, operation of the fan filterunit is stopped. Therefore, clean air in the substrate transfer areaenters inside the container, with which dust caused by the substratetransfer device sometimes enters inside the container through theentrance thereof, and therefore substrates inside the container areliable to be soiled by dust that thus enters the container.

SUMMARY OF THE INVENTION

The present invention has been achieved in view of the above issues, andthe object thereof is to provide a method for processing substrate thatsolves at least one of the problems in the conventional techniques.

The present invention provides a method for processing substrates forsubstrate processing facility, the substrate processing facilityincluding:

a plurality of substrate processing devices that process substrates;

a container that holds a plurality of the substrates with the substrateslined up vertically with space therebetween and that is tubular having agenerally quadrangular cross section, the container including a firstopening provided on one end side and a second opening provided on theother end side spaced apart in the horizontal direction from the firstopening, the first opening serving as an entrance for loading andunloading the substrates, the container having a fan filter unitprovided in an area of the second opening that causes movement of airfrom the second opening toward the first opening, and a lid that opensand closes the entrance of the container being provided in the area ofthe entrance of the container so as to open partially in a closed state,and to allow transfer of the substrates with the substrate transferdevice in an open state;

a storage shelf including a plurality of storage sections where thecontainers are stored;

a substrate loading/unloading section that corresponds to each of theplurality of substrate processing devices;

a substrate transfer device that provides a substrate to the substrateprocessing device from the container positioned in the substrateloading/unloading section, and that stores a substrate removed from thesubstrate processing device in the container positioned in the substrateloading/unloading section; and

a container transfer device that transfers the container to thesubstrate loading/unloading sections of the plurality of substrateprocessing devices and to the storage sections of the storage shelf,

the method for processing substrate to manufacture processed substratesby storing the container in the storage shelf, sequentially transferringthe stored container to the substrate loading/unloading section of eachof the plurality of substrate processing devices, and sequentiallyprocessing the substrates in the plurality of the substrate processingdevices including the steps of;

ventilating the container with the fan filter unit with the lid in theclosed state, when the container is stored in the storage shelf, andwhen the container is transferred with the substrate transfer device,and

ventilating the container with the fan filter with the lid of thecontainer in an open state, when the substrates are transferred to orfrom the substrate loading/unloading section with the substrate transferdevice.

That is, when the container is stored in the storage shelf or istransferred with the container transfer device, by ventilating thecontainer with the fan filter unit with the lid in the closed state,clean air is passed from the opening on the other end side toward theentrance of the container with the fan filter unit so as to bedischarged from partial openings in the entrance, so that dust presentinside the container is prevented from attaching to substrates and alsooutside air is prevented from entering inside the container, andtherefore it is possible to maintain purity of substrates in thecontainer. Also, when substrates are transferred in the substrateloading/unloading section with the substrate transfer device, byventilating the container with the fan filter with the lid of thecontainer in an open state, clean air is passed from the opening on theother end side toward the entrance of the container with the fan filterunit so as to be discharged from the entrance, so that dust presentinside the container is prevented from attaching to substrates and alsooutside air is prevented from entering inside the container, andtherefore, it is possible to maintain purity of substrates whileallowing transfer of substrates with the substrate transfer device.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a perspective view of substrate processing equipment.

FIG. 2 is a front view of substrate storage equipment.

FIG. 3 is a side view of the substrate storage equipment.

FIG. 4 is a diagram illustrating a clean air ventilation means.

FIG. 5 is a diagram illustrating a storage section at the first level ofa storage shelf.

FIG. 6 is a side view illustrating a substrate transfer area.

FIG. 7 is a diagram illustrating a storage section at the third level ofthe storage shelf.

FIG. 8 is a side view of a stacker crane.

FIG. 9 is a plan view of an article transfer device.

FIG. 10 is an exploded perspective view of a container main unit.

FIG. 11 is an exploded perspective view of a container.

FIG. 12 is a perspective view of the container.

FIG. 13 is a vertical cross-sectional view of the container when viewedfrom the front.

FIG. 14 is a side view illustrating attaching/detaching of a lid.

FIG. 15 is a side view illustrating attaching/detaching of a fan filterunit.

FIG. 16 is a side view illustrating closed and open states of the lid.

FIG. 17 is a side view illustrating closed and open states of the lid.

FIG. 18 is a side view illustrating a controller of the fan filter unit.

DETAILED DESCRIPTION OF PREFERRED EMBODIMENTS

The following is a description of preferred embodiments of the presentinvention, with reference to the accompanying drawings.

As shown in FIGS. 2 and 6, substrate processing equipment includes aplurality of substrate processing devices 3 that process a substrate 1having, for example, a rectangular shape, a storage shelf 5 including aplurality of storage sections 4 that store a container 2 that verticallyholds a plurality of substrates 1 aligned at certain intervals, asubstrate transfer device 7 that takes out the substrates 1 one at atime from the container 2 positioned in a substrate loading/unloadingsection 6 for each of a plurality of the substrate processing device 3so as to supply the substrate taken out to the corresponding substrateprocessing device 3, and store the substrate 1 removed from thesubstrate processing device 3 into the container 2 positioned in thesubstrate loading/unloading section 6, and a container transfer device 8that transfers the container 2 to the substrate loading/unloadingsection 6 of each of the plurality of the substrate processing devices 3and the storage sections 4 of the storage shelf 5.

As shown in FIG. 1, the substrate processing equipment is provided withplural units of substrate storage equipment A and process step equipmentB. As shown in FIG. 2, each unit of substrate processing equipment Aincludes the storage shelf 5 and a stacker crane 10 as the containertransfer device 8. Also as shown in FIG. 6, each unit of process stepequipment B includes the substrate processing device 3 and the substratetransport device 7.

This substrate processing equipment employs a substrate processingmethod in which the containers 2 are stored in the storage shelf 5 andthe stored containers 2 are sequentially transferred to the substrateloading/unloading section 6 of each of a plurality of the substrateprocessing devices 3, and then the substrates 1 are sequentiallyprocessed by a plurality of the substrate processing devices 3 so as tomanufacture processed substrates.

That is, operations of the substrate transfer device 7 and the containertransfer device 8 are controlled by a control device (not shown). Thecontrol device controls operations of the substrate transfer device 7and the container transfer device 8 as follows. The container transferdevice 8 sequentially transfers the containers 2 to the substrateloading/unloading section 6 of each of a plurality of the substrateprocessing devices 3. Every time the container 2 is transferred to thesubstrate loading/unloading section 6, the substrate transfer device 7takes out the substrates 1 one at a time from the container 2 so as tosupply the substrate 1 taken out to the substrate processing device 3,and stores the substrate 1 removed from the substrate processing device3 in the container 2. This control device includes components such asmicroprocessor, a communication section, a memory, algorithms stored inthe memory, which are required to perform all functions described inthis specification. In addition, this control device may be arranged onthe floor of the equipment, or may be arranged in the container transferunit or the storage shelf 5.

A plurality of substrate processing devices 3 independently performprescribed processes such as coating, exposure and developing, andtherefore they sometimes vary in the processing amount of the substrate1. The control device controls operations of the container transferdevice 8 such that when any time lag occurs in processing a certainsubstrate 1 during sequential transfer to the loading/unloading section6, the container 2 that stores the certain substrate 1 to be processedis temporarily stored in the storage shelf 5.

As the container transfer device 8, the stacker crane 10, which is acontainer transfer unit for the storage shelf and provided correspondingto the storage shelf 5, and a reciprocating trolley 11 and a circulatingtrolley 12, which are container transfer units between shelves thattransfer the container 2 between a plurality of loading/unloadingsections 9 in each of a plurality of storage shelves 5, are provided.

As shown in FIG. 1, the reciprocating trolley 11 and circulating trolley12 transfer the container 2 outside the substrate storage equipment A.The reciprocating trolley 11 reciprocates between two adjacent units ofsubstrate storage equipment A, and transfer the container 2 between thetwo adjacent units. The circulating trolley 12 circulates around pluralunits of substrate storage equipment A, and transfer the container 2 tothese plural units.

Also as shown in FIG. 2, the stacker crane 10 transfers the container 2inside the substrate storage equipment A, and reciprocates along amotion space created between a pair of storage shelves 5 arranged facingeach other so as to transfer the container 2 between a plurality ofstorage sections 4 of a pair of the facing storage shelves 5.

Specifically, when the container 2 is transferred to the storage section4 or the substrate loading/unloading section 6 (as origin of transfer)to the storage section 4 or the substrate loading/unloading section 6(as transfer destination) with the container transfer device 8, if theorigin of transfer and the transfer destination are in different unitsof substrate storage equipment A, the container 2 is sequentiallytransferred in a relayed manner by the stacker crane 10 of the substratestorage equipment A as the origin of transfer, reciprocating trolley 11,circulating trolley 12, and the stacker crane 10 of the substratestorage equipment A as the transfer destination, in this order. If theorigin of transfer and the transfer destination are in the same unit ofsubstrate storage equipment A, the container 2 is transferred by thestacker crane 10 of that unit of substrate storage equipment A.

As shown in FIG. 4, the substrate processing equipment includes adown-flow type clean air ventilation means 23, which ventilates a cleanspace 13 with clean air (or filtered air) from the ceiling portion tothe floor portion of the clean space 13. In the clean space 13 with thedown-flow ventilation, a plurality of substrate processing devices 3,the storage shelve 5, the substrate transfer device 7, and the containertransfer device 8 are provided. The substrate storage equipment A isprovided so as to be open to the surrounding area, and is configuredsuch that clean air can flow into and from the substrate storageequipment A.

Further explanation of the clean air ventilation means 23 is providedbelow. As shown in FIG. 4, in the clean air ventilation means 23, thefloor portion of the clean space 13 is formed by a porous grating floor14, and the ceiling portion of the clean space 13 is formed by an airfilter 15 composed of an HEPA filter and the like. An air intake chamber16 formed below the grating floor 14 and a chamber 17 formed above theair filter 15 are communicated via a circulation path 19 provided with aventilation fan 18 and a pre-filter 21. With the ventilation fan 18, airin the clean space 13 is taken in to the circulation path 19 via thegrating floor 14 and the air intake chamber 16, and the air taken in isblown downward to the clean space 13 as clean air via the pre-filter 21,the chamber 17 and the air filter 15. In this manner, air in the cleanspace 13 is circulated while being purified with the pre-filter 21 andthe air filter 15, thereby passing clean air from the ceiling portion tothe floor portion. The circulation path 19 is connected to an outsideair intake path 20 on the upstream side from the ventilation fan 18, andan air discharge path 22 on the downstream side from the ventilation fan18, and part of air in the clean space 13 circulated by the clean airventilation means 23 is exchanged with outside air.

As shown in FIG. 6, the substrate processing equipment includes a cleanair ventilation means for transfer area 25 that ventilates a transferarea with clean air in order to maintain purity of a substrate transferarea 24 where the substrate transfer device 7 transfers the substrates 1between the substrate loading/unloading section 6 and the substrateprocessing device 3.

That is, in the substrate transfer area 24 of the process step equipmentB, a partition wall 26 that covers the space for substrate transferoperation by the substrate transfer device 7, such that the end portionthereof on the side toward the storage shelf 5 is open and the other endportion thereof on the side toward the substrate processing device 3 iscommunicated with the substrate processing device 3. A plurality oftransfer area fan filter units 27 as the clean air ventilation means fortransfer area 25 are provided in the ceiling portion of the partitionwall 26. Clean air obtained by further purifying clean air in the cleanspace 13 by a plurality of transfer area fan filter units 27 is passedfrom the ceiling portion to the floor portion of the substrate transferarea 24, thereby making the space covered by the partition wall 26 adown-flow ventilation space.

As shown in FIGS. 2 to 4, the storage shelf 5 is constituted by a pairof front and rear columns 31 provided erect on the grating floor 14 andspaced apart in the shelf longitudinal width direction, and mount andsupport sections 32 disposed bridging the pair of front and rear columns31 and arranged at certain intervals in the vertical direction.

In the storage shelf 5, a plurality of storage sections 4, which areformed by a pair of front and rear column 31 and a pair of right andleft mount and support sections 32, are provided arranged vertically andhorizontally. The storage sections 4 adjacent in the shelf longitudinalwidth direction and the vertical direction are communicated to eachother such that air can flow therethrough.

The storage sections 4 at the lowest level are arranged above thegrating floor 14 so as to create an interval between them. Below thestorage sections 4 at the lowest level, a flow space is formed whereclean air flows.

Part of a plurality of storage sections 4 of the storage shelf 5 serveas the substrate loading/unloading section 6, and part of a plurality ofstorage sections 4 of the storage shelf 5 serve as the loading/unloadingsection 9.

Further description is provided below. As shown in FIG. 5, of aplurality of storage sections 4 at the lowest level of the storage shelf5, the storage sections 4 that correspond to the substrate processingdevice 3 serve as the substrate loading/unloading section 6, which areconfigured such that the substrate transfer device 7 can take out orstore the substrates 1 one at a time through the rear face side of thestorage shelf 5 with respect to the container 2 positioned in thesubstrate loading/unloading section 6. Further, since the storagesections at the lowest level are arranged above the grating floor 14 soas to create an interval between them as described above, the substrateloading/unloading section 6 is positioned higher than the floor portion.

As shown 7, of a plurality of storage sections 4 at a middle level ofthe storage shelf 5, the storage sections 4 that correspond to thereciprocating trolley 11 and the circulating trolley 12 serve as theloading/unloading sections 9. The loading/unloading section 9 thatcorresponds to the reciprocating trolley 11 is configured such that thecontainer 2 can be loaded and unloaded through the rear face side of thestorage shelf 5 by the reciprocating trolley 11, and further, theloading/unloading section 9 that corresponds to the circulating trolley12 is configured such that the container 2 can be loaded and unloadedthrough the lateral face side of the storage shelf 5 by the circulatingtrolley 12.

As shown in FIGS. 2, 3 and 8, the stacker crane 10 includes a traveldolly 35 that travels along two travel rails 34 disposed along thelongitudinal direction on the travel path in front of the storage shelf5, an elevator platform 37 guided and supported by a pair of elevatormasts 36 so as to be capable of freely ascending and descending alongthe elevator masts 36 provided erect on the travel dolly 35, and afolk-type article transfer device 38 supported by the elevator platform37 capable of transferring the container 2 between the storage section 4and itself. The stacker crane 10 can freely travel in the motion spacein front of the storage shelf 5 in the shelf longitudinal widthdirection due to horizontal motion of the travel dolly 35,ascending/descending motion of the elevator platform 37 and operationsof the article transfer device 38, and transfers the container 2 to thesubstrate loading/unloading section 6, the loading/unloading section 9and the storage sections 4 of the storage shelf 5 other than thoseserving as the substrate loading/unloading section 6 or theloading/unloading section 9.

The travel dolly 35 is provided with a total of four travel wheels 39,two front and rear tires for each of two travel rails 34, and a travelmotor 40 rotationally drives each travel wheel 39 so that the traveldolly 35 travels along the travel path.

The respective upper end portions of a pair of elevator masts 36 areconnected via an upper frame 41.

As shown in FIG. 8, to each of end portions in the front-and-reardirection of the elevator platform 37, one end portions of a pair ofelevating chains 45 are connected. One of the pair of elevating chains45 is wound around a guiding sprocket 46 provided in an upper endportion of the elevator mast 36 with the other end thereof beingconnected to a balance weight 47. The other of the pair of elevatingchains 45 is wound around a driving sprocket 48 provided in a lower endportion of elevator mast 36 with the other end thereof being connectedto the balance weight 47. By rotationally driving the driving sprocket48 using an elevator motor 49, the elevator platform 37 is ascended anddescended.

As shown in FIG. 9, the article transfer device 38 includes a revolvingtable 50 capable of freely revolving around a vertical axis core P1, anda link mechanism 52 that supports a mount section 51 provided above therevolving table 50 such that the mount section 51 can be freely extendedand withdrawn. The article transfer device 38 can move the mount section51 in a revolving manner through revolution of the revolving table 50,and also can switch the state thereof between a state withdrawn abovethe elevator platform 37 (see FIG. 5) and a state extended toward thestorage section 4, due to extension and retraction of the link mechanism52. The article transfer device 38 corresponds to a revolving means thatenables revolving of the container 2 supported.

As shown in FIG. 3, the substrate storage equipment A includes a controlmeans H that controls operations of the stacker crane 10.

The control means H is configured so as to control operations of thestacker crane 10 such that the container 2 is transferred between aplurality of storage sections 4, by controlling operations of the travelmotor 40, the elevator motor 49 and the article transfer device 38 basedon instructions of a superior control device that manages operations ofthe container transfer device 8.

The control means H, in both of a pair of the storage shelves 5, isconfigured so as to control operations of the container transfer device8 such that the container 2 is stored in the storage section 4 in astate in which the side of the container 2 on which a fan filter unit 64is provided is positioned on the side toward the motion space, and theside of the container 2 toward an entrance 72 is positioned on the sideaway from the motion space. The fan filter unit 64 (also referred to asFFU) includes a fan, an electric motor that drives the fan, a filter, abattery 71 and a power receiving section 70 a that transfer power to thebattery 71 or the electric motor, which are supported by a single FFUframe unit 90. The fan revolves around an axis that extendshorizontally.

That is, the control means H is configured so as to control operationsof the stacker crane 10 such that, when the container 2 is transferredbetween a pair of facing storage shelves 5, if the storage section 4 asthe origin of transfer and the storage section 4 as the transferdestination are in the same storage shelf 5, a container 2 is removedfrom the storage section 4 as the origin of transfer, and stored in thestorage section 4 as the transfer destination without revolving thecontainer 2 by the article transfer device 38, so that the container 2is stored, also in the storage section 4 as the transfer destination, ina state in which the side of the container 2 on which the fan filterunit 64 is provided is positioned on the side toward the motion space,and the side of the container 2 on which a lid 65 is provided (theentrance side) is positioned on the side away from the motion space, asin the storage section 4 as the origin of transfer. Furthermore, thecontrol means H is configured so as to control operations of the stackercrane 10 such that, if the storage section 4 as the origin of transferand the storage section 4 as the transfer destination are in differentstorage shelves 5, the container 2 is removed from the storage section 4as the origin of transfer, and stored in the storage section 4 as thetransfer destination after revolving the container 2 by 180 degrees withthe article transfer device 38, so that the container 2 is stored, alsoin the storage section 4 as the transfer destination, in a state inwhich the side of the container 2 on which the fan filter unit 64 isprovided is positioned on the side toward the motion space, and the sideof the container 2 on which the lid 65 is erected is positioned on theside away from the motion space, as in the storage section 4 as theorigin of transfer.

As shown in FIGS. 5 and 6, the substrate transfer device 7 includes asubstrate transfer conveyer 54 that mounts and transfers the substrate 1between the substrate processing device 3 and the vicinity of thestorage shelf 5, a substrate transfer robot 55 that mounts and transfersthe substrate 1 between the container 2 positioned in the substrateloading/unloading section 6 and the end portion of the substratetransfer conveyer 54 on the side toward the storage shelf.

The substrate transfer robot 55 includes a moving dolly 56 that moves inthe rear face side of the storage shelf 5 along the shelf longitudinalwidth direction, and an elevating section 57 supported by the movingdolly 56 so as to be capable of freely accenting and descending, as wellas rotating, and a folk-shaped support section 59 connected to theelevating section 57 via a link mechanism 58. The substrate transferrobot 55 is configured so as to transfer the substrates 1 one at a timefrom the container 2 positioned in the substrate loading/unloadingsection 6 to the end portion of the substrate transfer conveyer 54 onthe side toward the storage shelf through accenting/descending androtation of the elevating section 57, as well as extension andretraction of the link mechanism 58, and to transfer the substrates 1 atthe end portion of the substrate transfer conveyer 54 on the side towardthe storage shelf one at a time to the container 2 positioned in thesubstrate loading/unloading section 6.

As shown in FIG. 6, the substrate transfer conveyer 54 is configured soas to transfer the substrate 1 by rotationally driving a rotation roller61, while the rotation roller 61 supporting the substrate 1 at both endsthereof in the longitudinal width direction. As shown in FIG. 5, as thesubstrate transfer conveyer 54, a pre-processing substrate transferconveyer 54 that transfers unprocessed substrates 1 received from thesubstrate transfer robot 55 to the substrate processing device 3, and apost-processing substrate transfer conveyer 54 that transfers processedsubstrates 1 removed from the substrate processing device 3 toward thestorage shelf 5 are provided.

As shown in FIGS. 11 and 12, the container 2 is formed in a quadrangulartube shape turned over sideways. An opening on one end side of thecontainer 2 (first opening) serves as the entrance 72 used for loadingand unloading the substrate 1, the fan filter unit 64 that performsventilation from an opening on the other end side of the container 2(second opening) toward the entrance 72 is provided at the an openingportion on the other end side of the container 2 (namely, area of thesecond opening), and the lid 65 that opens and closes the entrance 72 ofthe container 2 is provided at the entrance portion of the container 2such that the lid 65 partially opens in a closed state, and also allowstransfer of the substrate 1 by the substrate transfer device 7 in anopen state.

In other words, an opening at one end side of a container main unit 66formed in a quadrangular tube shape turned over sideways is configuredas the entrance 72 for loading and unloading the substrates 1 one at atime, the fan filter unit 64 that performs ventilation from an openingon the other end side of the container main unit 66 toward the entrance72 is provided at an opening portion on the other end side of thecontainer main unit 66, and the lid 65 that opens and closes theentrance 72 of the container main body 66, is provided at the entranceportion of the container main unit 66 such that the lid 65 partiallyopens as a vent hole 75 in a closed state, and also allows transfer ofthe substrate 1 by the substrate transfer device 7 in an open state.

As shown in FIG. 10, the container main unit 66 is formed as alattice-like frame using a one end side rectangular frame 93 having arectangular shape that forms an opening on one end side of the containermain unit 66, an other end side rectangular frame 94 having arectangular shape as well that forms an opening on the other end side ofthe container main unit 66, corner frame members 95 that connects theone end side rectangular frame 93 and the other end side rectangularframe 94 at their respective corners, connecting frame members 96appropriately bridging the other end side portion, right and left sideportions, top and bottom portions other than the one end side portion ofthe container main unit 66. In both side portions, exterior surfacemembers 97 provided so as to cover the opening formed in both sideportions and form the same plane with the rectangular frame and framemembers on the exterior surface side, and interior surface members 98provided so as to form the same plane with the rectangular frame andframe members on the interior surface side are provided. In the top andbottom portions, the interior surface members 98 are provided so as tocover the openings formed in both of the top and bottom portions. Inthis manner, the container main unit 66 is formed in a quadrangular tubeshape turned over sideways.

Then, in the one end side rectangular frame 93, the other end siderectangular frame 94 and the lower frame members 95, support sectionsfor storage 82 are provided, at which the container main unit 66 ismounted and supported when stored in the storage section 4 of thestorage shelf 5. In the one end side rectangular frame 93 and the otherend side rectangular frame 94, support sections for transfer 83 areprovided, at which the container main unit 66 is mounted and supportedwhen transferred by the container transfer device 8 such as the stackercrane 10.

As shown in FIGS. 13 and 17, in the container main unit 66, supportmembers 67 bridge the right and left side wall portions thereof. Aplurality of support members 67 are provided lined up in thefront-and-rear direction to support a single substrate 1, and alsoarranged in plural vertical levels at set intervals such that the numberof levels corresponds to the number of substrates 1 stored in thecontainer 2.

As shown in FIG. 13, each support member 67 includes a main unit frame69 bridging the connecting frame members 96 at the right and left sidewall portions of the container main unit 66, and a plurality of pinmembers 68 provided erect thereon. The pin members 68 are provided erectat the set positions on the main unit frame 69 so as not to interferewith the support section 59 of the substrate transfer robot 55 while thesubstrate transfer robot 55 loads and unloads the substrate 1 to andfrom the container 2. By supporting the substrate 1 with a plurality ofpin members 68, a gap is formed between the main unit frame 69 and thesubstrate 1 supported by the pin members 68, where the support section59 of the substrate transport robot 55 is inserted.

As shown in FIG. 11, three fan filter units 64 are provided on thecontainer main unit 66, and these three fan filter units 64 are attachedto the FFU frame unit 90, which is joined to the opening portion of theother end side of the container main unit 66 so as to be supported,lined up in the longitudinal width direction of the FFU frame unit 90.

The FFU frame unit 90 is provided with the power receiving section 70 aof a non-contact power supply device 70, and the three fan filter units64 are operated with power supplied by a power supply section 70 b (seeFIG. 2) of the non-contact power supply device 70, which is providedsupported by the mount and support section 32 in each storage section 4.

The FFU frame unit 90 also includes the battery 71 that stores powersupplied to the power receiving section 70 a. In the case in which asupply of power to the container 2 is stopped as a result of the powerreceiving section 70 a being separated from the power supply section 70b, such as when the container 2 is transferred by the stacker crane 10,power stored in the battery 71 is used to operate the three fan filterunits 64.

Next, the lid 65 is described.

As shown in FIG. 16, the vent hole 75 in the lid 65 is formed in a slitshape extending horizontally over substantially the same length as thelongitudinal width of the entrance 72, and a plurality of vent holes 75are formed arranged vertically such that each vent hole 75 correspondsto each of a plurality of substrates 1 held in the container main unit66.

As shown in FIG. 16B, the lid 65 is configured so as to open theentrance 72 such that substrate loading/unloading openings 76, which isformed in a slit shape extending horizontally over substantially thesame length as the longitudinal width of the entrance 72, are formed atthe positions corresponding to a plurality of substrates 1 held in thecontainer main unit 66, and also that the access to the adjacentsubstrate loading/unloading openings 76 is prevented, in an open statein which loading and unloading of the substrate 1 is allowed.

Further description is provided for the lid 65. As shown in FIG. 16, thelid 65 is formed by vertically arranging a plurality of lid formingmembers 77 having substantially the same longitudinal width as theentrance 72, and is configured so as to open the entrance 72 such thatthe bent holes 75 are formed between the adjacent lid forming members 77in a closed state, and also that the substrate loading/unloadingopenings 76 are formed between the adjacent lid forming members 77 in anopen state, which is achieved by rotating the lid forming members 77around the axis core disposed along the longitudinal width direction ofthe entrance 72.

Each of a plurality of the lid forming members 77 is constituted by aplate-like member formed in a hollow thin plate shape when viewed fromthe side, and supported by a lid frame unit 78 at the center portionthereof so as to be freely rotating around the horizontal axis core. Thelid 65, as shown in FIG. 16A, becomes a closed state in which acomparatively small opening formed between adjacent lid forming members77 serves as the vent hole 75, as a result of rotating a plurality oflid forming members 77 around the horizontal axis core so as to be in aposition along the vertical direction. Also, the lid 65 becomes, asshown FIG. 16B, an open state in which a comparatively large openingformed between adjacent lid forming members 77 serves as the substrateloading/unloading opening 76, as a result of rotating a plurality of lidforming members 77 around the horizontal axis core so as to be in aposition along the front-and-rear direction.

That is, as shown in FIGS. 16A and 17A, when the lid 65 is in a closedstate, the vent holes 75 are open between a plurality of lid formingmembers 77, and therefore clean air can be passed with the fan filterunit 64 from the opening on the other end side of the container 2 towardthe entrance 72 to be discharged from the vent holes 75 in the entrance72. Since the vent holes 75 are formed as small openings with aplurality of lid forming members 77 in a position along the verticaldirection (direction that intersects the airflow direction), the speedof clean air discharged from the vent holes 75 is fast, and thus it ispossible to prevent entry of outside air into the container 2 from theentrance 72 of the container 2.

As shown in FIGS. 16B and 17B, when the lid 65 is in an open state, thesubstrate loading/unloading openings 76, which is larger than the venthole 75, are open between a plurality of lid forming members 77, andtherefore the substrate 1 can be loaded and unloaded through thesubstrate loading/unloading opening 76. The speed of clean airdischarged from the substrate loading/unloading opening 76 is fast,although not as fast as that in a closed state, as a result of theairflow path being narrowed due to a plurality of lid forming members 77in a position along the front-and-rear direction (airflow direction),and thus it is possible to prevent entry of outside air into thecontainer 2 from the entrance 72 of the container 2.

Also, between the adjacent lid forming members 77, the vent hole 75 isformed in a closed state and the substrate loading/unloading opening 76is formed in an open state, as described above. A plurality of lidforming member 77 do not contact each other in open and closed states ofthe lid 65, or while the lid 65 is switched into these states.Therefore, no dust is caused by the lid forming members 77 contactingeach other, and occurrence of dust from the lid 65 can be prevented.

The lid 65 is biased so as to return to a closed state. A connecting rod80 as an operation section that puts the lid 65 in an open state due toupward motion thereof is provided extending downward from the bottomface portion of the container main unit 66.

Further description is provided below. As shown in FIG. 16A, a base endportion of a link member 79 is connected to each of the lid formingmembers 77 in a position along the vertical direction, in a state inwhich the link member 79 extends downward behind the lid forming member77, such that the link member 79 and the lid forming member 77 canrotate in an integrated manner, and a free end portion of each linkmember 79 is connected to the connecting rod 80 that extends verticallyso as to be capable of freely rotating. As a result of moving theconnecting rod 80 upward in a closed state in which the lid formingmembers 77 are in a position along the vertical direction, an open stateis achieved in which the lid forming members 77 are in a position alongthe front-and-rear direction. Also, by moving the connecting rod 80downward in an open state in which the lid forming members 77 are in aposition along the front-and-rear direction, a closed state is achievedin which the lid forming members 77 are in a position along the verticaldirection.

The connecting rod 80 is biased downward by its own weight. The lid 65is in a closed state when the connecting rod 80 protrudes downward fromthe bottom face portion of the container main unit 66. In this state,when the container 2 is mounted on the substrate loading/unloadingsection 6, a lid projection section 81 provided in the mount and supportsection 32 of the substrate loading/unloading section 6 pushes theconnecting rod 80 upward, the lid forming members 77 are rotated via thelink members 79 and put in a position along the front-and-reardirection, thereby putting the lid 65 in an open state. It should benoted that by lifting the container 2 from the substrateloading/unloading section 6, the connecting rod 80 is pushed downward byits own weight. Then, the lid forming members 77 are rotated via thelink members 79 and put in a position along the vertical direction,thereby putting the lid 65 in a closed state. Downward motion of theconnecting rod 80 is restricted by a restricting member (not shown) suchthat the downward motion stops at a state in which a lower end portionof the connecting rod 80 protrudes downward from the bottom face portionof the container main unit 66.

The portion that pushes the connecting rod 80 upward, such as the lidprojection section 81 of the substrate loading/unloading section 6, isnot provided in the storage sections 4 other than those serving as thesubstrate loading/unloading section 6, or the container transfer device8 such as the stacker crane 10, so that the connecting rod 80 is pushedupward only when the container 2 is positioned in the substrateloading/unloading section 6. In this manner, the lid 65 of the container2 maintains a closed state when the container 2 is stored in the storagesection 4 other than those serving as the substrate loading/unloadingsection 6, or is transferred by the stacker crane 10 or the like.

That is, in the substrate processing equipment, when the container 2 isstored in the storage shelf 5, or transferred by the container transferdevice 8, purity of the substrate 1 is maintained by performingventilation with the fan filter units 64 with the lid 65 of thecontainer 2 in a closed state. When the substrate 1 is transferred bythe substrate transfer device 7 in the substrate loading/unloadingsection 6, purity of the substrate transfer area 24 is maintained by thefan filter units 64 performing ventilation with the lid 65 of thecontainer 2 in an open state, and also with the clean air ventilationmeans for transfer area 25. In this manner, the substrate processingmethod capable of maintaining purity of the substrate 1 is provided.

Then, the container 2 includes a controller 109 that controls operationsof three fan filter units 64 in order to increase the ventilation flowrate thereof when the lid 65 is in an open state.

That is, as shown in FIGS. 11 and 18, the FFR frame unit 90 includes adetection piece 107 capable of ascending/descending motion, whichascends as a result of being pushed upward by an FFU projection section106 provided in the mount and support section 32 of the substrateloading/unloading section 6 when the container 2 is mounted on thesubstrate loading/unloading section 6, and descends by its own weightwhen the container 2 is lifted up from the substrate loading/unloadingsection 6, a detection switch 108 including a limit switch that detectsthe ascending/descending motion of the detection piece 107 and sends thedetected information to the controller 109, and the controller 109 thatcontrols operations of the fan filter units 64 based on the detectedinformation from the detection switch 108. The controller 109 controlsoperations of the fan filter units 64 based on the detected informationfrom the detection switch 108, so as to increase the ventilation flowrate of the fan filter units 64 when the detection piece 107 is in anascended state, and decrease the ventilation flow rate of the fan filterunits 64 when the detection piece 107 is in a descended state.

The FFU projection section 106 is not provided in the storage sections 4other than those serving as the substrate loading/unloading section 6,or the container transfer device 8 such as the stacker crane 10, as thelid projection section 81.

Accordingly, the ventilation flow rate of the fan filter units 64increases when the container 2 is positioned in the substrateloading/unloading section 6 and the lid 65 is in an open state, and theventilation flow rate of the fan filter units 64 decreases when thecontainer 2 is not positioned in the substrate loading/unloading section6 and the lid 65 is in a closed state.

It is preferable to prevent the substrate 1 in the container 2 frombeing soiled by dust caused by the lid 65 when the lid 65 is switched toan open state or a closed state, by increasing the ventilation flow rateof the fan filter units 64 at a time point before the lid 65 is switchedto an open state, and decreasing the ventilation flow rate at a timepoint after the lid 65 is switched to a closed state. Such a relationbetween the switching of the lid 65 to an open state and a closed state,and increase and decrease in the ventilation flow rate of the fan filterunits 64 can be achieved by adjusting the height of the lid projectionsection 81 and the FFU projection section 106.

As shown in FIG. 11, the fan filter units 64 and the lid 65 aredetachably attached to the container main unit 66. The fan filter units64 and the lid 65 can be removed from the container 2 such that thecontainer 2 can be washed easily.

Specifically, as shown in FIG. 14, at the upper end portion of the lidframe unit 78 is provided a lid engagement member 99 that engages withan upper portion of the one end side rectangular frame 93 of thecontainer main unit 66 from above. At a lower end portion of the one endside rectangular frame 93, a lid engagement support plate 100 isprovided that engages with an engaged groove 78 a that is formed at thelower end portion of the lid frame unit 78 so as to mount and supportthe lid frame unit 78. The lid 65 can be attached and detached withrespect to the container main unit 66 by engaging and disengaging thelid engagement member 99 with an upper portion of the one end siderectangular frame 93, and engaging and disengaging the lid engagementsupport plate 100 with the engaged groove 78 a of the lid frame unit 78.

In addition, as shown in FIG. 15, at an upper end portion of the FFUframe unit 90, an FFU engagement member 88 is provided that engages withan upper portion of the other end side rectangular frame 94 of thecontainer main unit 66 from above. At a lower end portion of the otherend side rectangular frame 94, an FFU engagement support plate 89 isprovided that engages with an engaged groove 90 a that is formed at alower end portion of the FFU frame unit 90 so as to support and mountthe FFU frame unit 90. The fan filter units 64 can be attached anddetached with respect to the container main unit 66 along with the powersupply section 70 b and the battery 71, by engaging and disengaging theFFU engagement member 88 with an upper portion of the other end siderectangular frame 94, and engaging and disengaging the FFU engagementsupport plate 89 with the engaged groove 90 a of the FFU frame unit 90.

As shown FIG. 2, part of a plurality of storage sections 4 at the lowestlevel provided in the storage shelf 5 serve as the loading/unloadingsection 9 for cart where the container 2 can be loaded and unloaded witha cart 85 through the rear face side of the storage shelf 5. After thecontainer 2 is unloaded through the loading/unloading section 9 for cartusing the cart 85, the fan filter units 64 and the lid 65 can be removedfrom the container 2, so that the container 2 can be washed using acontainer washing device 86. At the rear face side of theloading/unloading section 9 for cart, a shutter 84 that closes the rearface side of the loading/unloading section 9 is provided. The controlmeans H controls operations of the stacker crane 10 such that thestacker crane 10 does not transfer the container 2 to theloading/unloading section 9 for cart while the shutter 84 is open.

Other Embodiments

(1) In the above embodiment, when the substrate 1 is transferred by thesubstrate transfer device 7 in the substrate loading/unloading section6, the ventilation flow rate of the fan filter units 64 of the container2 is increased. However, it is possible that the ventilation flow rateof the fan filter units 64 is not increased even when the substrate 1 istransferred by the substrate transfer device 7 in the substrateloading/unloading section 6.

That is, the ventilation flow rate of the fan filter units 64 of thecontainer 2 may be kept constant when the container 2 is stored in thestorage shelf 5, when the container 2 is transferred by the containertransfer device 8, and when the substrate 1 is transferred by thesubstrate transfer device 7 in the substrate loading/unloading section6.

Also, the ventilation flow rates of the fan filter units 64 of thecontainer 2 for when the container 2 is stored in the storage shelf 5,when the container 2 is transferred by the container transfer device 8,and when the substrate is transferred by the substrate transfer device 7in the substrate loading/unloading section 6 may be varied. For example,the ventilation flow rate of the fan filter units 64 of the container 2when the container 2 is transferred by the container transfer device 8may be set larger than that when the container 2 is stored in thestorage shelf 5, and the ventilation flow rate when the substrate istransferred by the substrate transfer device 7 in the substrateloading/unloading section 6 may be set larger than that when thecontainer 2 is transferred by the container transfer device 8.Specifically, the ventilation flow rate of the fan filter units 64 ofthe container 2 may be increased even when the container 2 istransferred by the container transfer device 8. The ventilation flowrate when the container 2 is transferred by the container transferdevice 8 may be equal to or larger than that when the substrate istransferred by the substrate transfer device 7 in the substrateloading/unloading section 6.

(2) In the above embodiment, some of a plurality of storage sections 4of the storage shelf 5 serve as the substrate loading/unloading section6. However, the substrate loading/unloading section 6 may be provided ina location different from the storage section 4, for example, thesubstrate loading/unloading section 6 may be provided separately in oneside in the longitudinal direction of the storage shelf 5.

Also, although some of a plurality of storage sections 4 of the storageshelf 5 serve as the loading/unloading section 9. However, theloading/unloading section 9 may be provided in a location different fromthe storage section 4, for example, the loading/unloading section 9 maybe provided separately in one side in the longitudinal direction of thestorage shelf 5.

(3) In the above embodiment, the stacker crane 10 as the containertransfer unit for storage shelf, which is provided so as to correspondto the storage shelf 5, and the reciprocating trolley 11 and thecirculating trolley 12 as the container transfer units for transferbetween storage shelves, which transfer the containers 2 between aplurality of loading/unloading sections 9 provided in each of aplurality of storage shelves 5 are provided as the container transferdevice 8. However, only the stacker crane 10 as the container transferunit for storage shelf provided so as to correspond to the storage shelf5 may be provided as the container transfer device 8.

Also, in the above embodiment, one stacker crane 10 as the containertransfer unit for the storage shelf is provided for a pair of storageshelves 5 arranged facing each other. However, a plurality of stackercranes 10 may be provided for a pair of storage shelves 5 arrangedfacing each other.

(4) In the above embodiment, the clean air ventilation means 23 isprovided in order to make a space provided with a plurality of substrateprocessing devices 3, the storage shelves 5, the substrate transferdevice 7 and the container transfer device 8 a clean space wheredown-flow ventilation with clean air from the ceiling portion to thefloor portion is performed. However, the clean air ventilation means 23may not be provided, and the space provided with a plurality ofsubstrate processing devices 3, the storage shelves 5, the substratetransfer device 7 and the container transfer device 8 may not be a cleanspace.

(5) In the above embodiment, the substrate loading/unloading section 6is positioned higher than the floor portion. However, the substrateloading/unloading section 6 may be positioned on the same level as thefloor portion, or may be positioned lower than the floor portion, whenthe stacker crane 10 travels a position lower than the floor portion,for example.

In the above embodiment, although the storage shelves 5 are disposed onthe floor portion (grating floor 14) of the clean space 13, the storageshelves 5 may be disposed on the bottom portion of the air intakechamber 16 located below the floor space.

(6) In the above embodiment, although the ceiling portion of the cleanspace 13 is formed by air filters, the ceiling portion of the cleanspace 13 may be formed by fan filter units for the ceiling portion.

(7) In the above embodiment, both side portions of the container mainunit 66 have a double structure including the exterior surface members97 and the interior surface members 98, it is possible that both sideportions have a single structure including only interior surfacemembers, as the top and bottom portions.

(8) In the above embodiment, the base end portion of the link member 79is connected to each of the lid forming members 77 in the position alongthe vertical direction, in a state in which the link member 79 extendsdownward behind the lid forming member 77, such that the link member 79and the lid forming member 77 can rotate in an integrated manner, andaccordingly the connecting rod 80 to which a free end portion of eachlink member 79 is connected so as to be capable of freely rotating islocated on the rear side (side of the container main unit) from therotation axis core of the lid forming members 77. However, it is alsopossible that the base end portion of the link member 79 is connected toeach of the lid forming members 77 in a position along the verticaldirection, in a state in which the link member 79 extends downward infront of the lid forming member 77, such that the link member 79 and thelid forming member 77 can rotate in an integrated manner, andaccordingly the connecting rod 80 to which a free end portion of eachlink member 79 is connected so as to be capable of freely rotating islocated on the front side (the opposite side to the container main unit)from the rotation axis core of the lid forming member 77.

(9) In the above embodiment, the connecting rod 80 is operated as aresult of moving the container 2 vertically in the substrateloading/unloading section 6 with the container transfer device 8,thereby switching the lid 65 between an open state and a closed state.However, it is also possible that a driving means such as an electricmotor is provided in the lid 65 for operating the connecting rod 80, andthe lid 65 is switched between an open state and a closed state as aresult of operating the connecting rod 80 with the driving means.

(10) In the above embodiment, a plurality of the lid forming members 77are configured such that all of them rotate in an integrated manner.However, it is also possible that when the lid 65 is in an open state,some of the lid forming members 77 are put in a position along thefrond-and-rear direction and other lid forming members 77 are put in aposition along the vertical direction, so that some lid forming members77 are kept in a position along the vertical direction even in an openstate in order to increase the speed of discharged clean air. For thispurpose, a plurality of lid forming member 77 may be configured so as tobe operated to rotate on an individual basis, or on a group basis ofsome lid forming members.

Specifically, for example, it is possible that when a plurality of lidforming members 77 are operated to rotate on a group basis of some lidforming members, the following configuration is possible. An upper halfof a plurality of the lid forming members 77 are connected at one endportions thereof in the longitudinal width direction to the connectingrod 80 on that one end side via the link members 79, and a lower half ofa plurality of the lid forming members 77 are connected at the other endportions thereof in the longitudinal width direction to the connectingrod 80 on that other end side via the link members 79, and consequently,the upper half of the lid forming members 77 are put in a position alongthe front-and-rear direction through operations of the connecting rod 80on the one end side so as to load and unload the substrate 1 in an upperhalf of the container 2, and the lower half of the lid forming members77 are put in a position along the front-and-rear direction throughoperations of the connecting rod 80 on the other end side so as to loadand unload the substrate 1 in a lower half of the container 2.

(11) In the above embodiment, the ventilation flow rate of the fanfilter unit 64 is varied based on the ascending/descending motion of thedetection piece 107 by the FFU projection section 106. However, theventilation flow rate of the fan filter unit 64 may be varied based onthe ascending/descending motion of the connecting rod 80 by the lidprojection section 81.

Specifically, it is possible that a detection means that detects theascending/descending motion of the connecting rod 80 and transmitsdetection signals to the controller 109 is provided to the lid frameunit 78, and the controller 109 controls operations of the fan filterunits 64 based on the detection information from the detection means soas to increase the ventilation flow rate of the fan filter units 64 whenthe connecting rod 80 is in an ascended state and the lid 65 is open,and decrease the ventilation flow rate of the fan filter units 64 whenthe connecting rod 80 is in a descended state and the lid 65 is closed.

It should be noted that transmission of the detected information fromthe detection means to the controller 109 may be performed by wire, byproviding in the container main unit 66 a cable connected to the lidframe unit 78 and the FFU frame unit 90 in a separable manner, oralternatively, may be performed wirelessly by providing a transmitter inthe lid frame unit 78, and a receiver in the FFU frame unit 90.

1. A method for processing substrates for substrate processing facility,the substrate processing facility comprising: a plurality of substrateprocessing devices that process substrates; a container that holds aplurality of the substrates with the substrates lined up vertically withspace therebetween and that is tubular having a generally quadrangularcross section, the container including a first opening provided on oneend side and a second opening provided on the other end side spacedapart in the horizontal direction from the first opening, the firstopening serving as an entrance for loading and unloading the substrates,the container having a fan filter unit provided in an area of the secondopening that causes movement of air from the second opening toward thefirst opening, and a lid that opens and closes the entrance of thecontainer being provided in the area of the entrance of the container soas to open partially in a closed state, and to allow transfer of thesubstrates with the substrate transfer device in an open state; astorage shelf including a plurality of storage sections where thecontainers are stored; a substrate loading/unloading section thatcorresponds to each of the plurality of substrate processing devices; asubstrate transfer device that provides a substrate to the substrateprocessing device from the container positioned in the substrateloading/unloading section, and that stores a substrate removed from thesubstrate processing device in the container positioned in the substrateloading/unloading section; and a container transfer device thattransfers the container to the substrate loading/unloading sections ofthe plurality of substrate processing devices and to the storagesections of the storage shelf, the method for processing substrate tomanufacture processed substrates by storing the container in the storageshelf, sequentially transferring the container to the substrateloading/unloading section of each of the plurality of substrateprocessing devices, and sequentially processing the substrates in theplurality of the substrate processing devices comprising the steps of:ventilating the container with the fan filter unit with the lid in theclosed state, when the container is stored in the storage shelf, andwhen the container is transferred with the substrate transfer device,and ventilating the container with the fan filter with the lid of thecontainer in an open state, when the substrates are transferred to orfrom the substrate loading/unloading section with the substrate transferdevice.
 2. The method for processing substrates of claim 1, wherein aclean air ventilation means for a transfer area is provided that movesclean air in a substrate transfer area where the substrates aretransferred with the substrate transfer device between the substrateloading/unloading section and the substrate processing devices, themethod further comprising a step of: operating the clean air ventilationmeans for the substrate transfer area at least when the substrates aretransferred to or from the substrate loading/unloading section with thesubstrate transfer device.
 3. The method for processing substrates ofclaim 1, further comprising a step of increasing a ventilation flow rateof the fan filter unit when the lid is in the open state.
 4. The methodfor processing substrates of claim 1, wherein a plurality of storageshelves are provided with each shelf associated with each of theplurality of the substrate processing devices, and some of the pluralityof storage sections of the storage shelves serve as the substrateloading/unloading section, and as the container transfer device, acontainer transfer unit for storage shelf provided in association withthe storage shelves, and a container transfer unit for transfer betweenshelves that transfers the container between a plurality ofloading/unloading sections of the plurality of storage shelves areprovided.
 5. The method for processing substrates of claim 1, whereinthe plurality of substrate processing devices, the storage shelf, thesubstrate transfer device and the container transfer device are providedin a clean space where clean air is caused to move generally downwardlyfrom a ceiling portion to a floor portion, and the substrateloading/unloading section is positioned higher than the floor portion.6. The method for processing substrates of claim 1, wherein the fanfilter unit comprises a fan and filter and a power receiving sectionsupported by a frame unit.
 7. The method for processing substrates ofclaim 6, wherein the fan filter unit comprises a battery to supply powerto the fan.